Product by Industrial/Use
Products
Semiconductor
Ion Implant source
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- Application
- - Features of W, Mo and Ta materials2) used for ion source head of ion implanting process
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- Characteristics
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- High quality raw material is used through excellent sintering process such as
high purity metallic powder raw material and CIP
- Customized production by demand of customers through leading edge processing facility
- Price competitiveness with experiences and technologies on tungsten and molybdenum