Product by Material
Product by Material
Tungsten/ Molybdenum
Ion Implant source
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- Application
- - Features of W, Mo and Ta materials2) used for ion source head of ion implanting process
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- Characteristics
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- High quality raw material is used through excellent sintering process such as
high purity metallic powder raw material and CIP
- Customized production by demand of customers through leading edge processing facility
- Price competitiveness with experiences and technologies on tungsten and molybdenum
Ion-implant Filament
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- Application
- A filament used in the ion implant process, emitting the ion beams in order to help create diode properties by injecting ions into the active areas (sources, drains, etc.) in creating semiconductors.
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- Characteristics
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- Made with high-purity tungsten enabling precise calibration.
- Long life span afforded by thermal treatment.